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Silicon Nitride Optical Waveguide
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Lithium Niobate Optical Waveguide Fabrication
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Silicon Optical Waveguide
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6‑inch PIC
6‑inch PIC
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Silicon Nitride Optical Waveguide
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Top cladding: SiO₂ deposited by PECVD, 800 nm-thick SiO₂ grown via PECVD
Top cladding with SiO₂ grown by PECVD; Coverage performance of 800 nm SiO₂ deposited via PECVD
Top cladding: SiO₂ grown by PECVD; Macro image of 800 nm SiO₂ deposited via PECVD
Silicon Nitride (SiN) fabricated by ICP etching, compatible with 200 nm and 400 nm etching processes.
Silicon Nitride (SiN) fabricated via ICP etching. The etching selectivity remains stably at 1.5. Etching uniformity of 6-inch wafers is less than 3% with excellent consistency.
Silicon Nitride (SiN) formed by ICP etching, sidewall verticality over 88°, well-defined profile
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Lithium Niobate Optical Waveguide Fabrication
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LN Modulator Bandwidth: 60 GHz
Q factor of All-Pass Microring: 1×10⁶
Grating Coupler Loss: 8 dB
Directional Coupler
1×2 MMI Insertion Loss: 0.2 dB
Crossed waveguide loss: 0.02 dB
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Silicon Optical Waveguide
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Microring modulator: 30 GHz bandwidth
Crossed waveguide loss: 0.028 dB per unit
Heating electrode: TiN thermal electrode
Electro-optic switch extinction ratio: 45 dB
All-Pass Micro-ring Q: 10 to the power of 5
1×2 MMI Insertion Loss: 0.043 dB per port
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